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Integration issues in step and repeat UV nanoimprint lithography

dc.contributor.authorCharpin-Nicolle, C.
dc.contributor.authorChiaroni, J.
dc.contributor.authorLe Cunff, Y.
dc.contributor.authorDenis, H.
dc.contributor.authorRochat, N.
dc.contributor.authorVillani, M. L.
dc.contributor.authorMassin, J.
dc.contributor.authorIrmscher, M.
dc.contributor.authorVratzov, B.
dc.contributor.authorvan Hossen, H.
dc.contributor.authorGubbini, P.
dc.contributor.authorLorusso, Gian
dc.contributor.authorVan Den Heuvel, Dieter
dc.date.accessioned2021-10-17T06:29:19Z
dc.date.available2021-10-17T06:29:19Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13500
dc.sourceIIOimport
dc.titleIntegration issues in step and repeat UV nanoimprint lithography
dc.typeOral presentation
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.source.peerreviewno
dc.source.conference34th International Conference on Micro and Nano Engineering
dc.source.conferencedate15/09/2008
dc.source.conferencelocationAthens Greece
imec.availabilityPublished - imec


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