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Effect of quartz window temperature on plasma composition during STI etch

dc.contributor.authorDanilkin, Evgeny
dc.contributor.authorShamiryan, Denis
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMilenin, Alexey
dc.contributor.authorBoullart, Werner
dc.contributor.authorKrasnikov, G.
dc.contributor.authorGutschin, O
dc.contributor.authorMochalov, A
dc.date.accessioned2021-10-17T06:41:20Z
dc.date.available2021-10-17T06:41:20Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13583
dc.sourceIIOimport
dc.titleEffect of quartz window temperature on plasma composition during STI etch
dc.typeProceedings paper
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage7.03E+03
dc.source.conferenceMicro- and Nanoelectronics 2007
dc.source.conferencedate1/10/2007
dc.source.conferencelocationZvenigorod Russia
imec.availabilityPublished - open access
imec.internalnotesSPIE Proceedings; Vol. 7025


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