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Stabilisation and control of improved nano-ceria dispersions for STI CMP slurries

dc.contributor.authorDe Messemaeker, Jo
dc.contributor.authorKellens, Kristof
dc.contributor.authorVan Genechten, Dirk
dc.contributor.authorPut, Stijn
dc.contributor.authorNelis, Daniel
dc.contributor.authorStrauven, Yvan
dc.contributor.authorOng, Patrick
dc.contributor.authorDevriendt, Katia
dc.date.accessioned2021-10-17T06:45:08Z
dc.date.available2021-10-17T06:45:08Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13607
dc.sourceIIOimport
dc.titleStabilisation and control of improved nano-ceria dispersions for STI CMP slurries
dc.typeProceedings paper
dc.contributor.imecauthorKellens, Kristof
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Planarization / CMP Technology - ICPT
dc.source.conferencedate10/11/2008
dc.source.conferencelocationHsinchu Taiwan
imec.availabilityPublished - imec


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