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Impact of precursors in the atomic layer deposition of high-k dielectrics on semiconductor substrates

dc.contributor.authorDelabie, Annelies
dc.contributor.authorNyns, Laura
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorCaymax, Matty
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBrunco, David
dc.contributor.authorSwerts, Johan
dc.contributor.authorMaes, Jan Willem
dc.contributor.authorKim, Eunji
dc.contributor.authorMcIntyre, Paul
dc.date.accessioned2021-10-17T06:52:35Z
dc.date.available2021-10-17T06:52:35Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13651
dc.sourceIIOimport
dc.titleImpact of precursors in the atomic layer deposition of high-k dielectrics on semiconductor substrates
dc.typeMeeting abstract
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorSwerts, Johan
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewno
dc.source.beginpage139
dc.source.endpage141
dc.source.conferenceChina Semiconductor Material International Conference - CSMIC
dc.source.conferencedate19/03/2008
dc.source.conferencelocationShanghai China
imec.availabilityPublished - imec


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