Publication:
Double hard mask strategy for patterning 0.186 micron2 SRAM cells using FinFET technology
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1931 since deposited on 2021-10-17
1last month
Acq. date: 2026-04-06
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Statistics
Views
1931 since deposited on 2021-10-17
1last month
Acq. date: 2026-04-06
Citations