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Metal gate thickness optimization for MuGFET performance improvement

dc.contributor.authorFerain, Isabelle
dc.contributor.authorCollaert, Nadine
dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorConard, Thierry
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorSwerts, Johan
dc.contributor.authorJurczak, Gosia
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-17T07:05:32Z
dc.date.available2021-10-17T07:05:32Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13720
dc.sourceIIOimport
dc.titleMetal gate thickness optimization for MuGFET performance improvement
dc.typeProceedings paper
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage202
dc.source.endpage205
dc.source.conference38th European Solid-State Device Research Conference - ESSDERC
dc.source.conferencedate16/09/2008
dc.source.conferencelocationEdinburgh UK
imec.availabilityPublished - open access


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