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Extraction and identification of resist modeling parameters for EUV lithography
Publication:
Extraction and identification of resist modeling parameters for EUV lithography
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Date
2008
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Fonseca, Carlos
;
Gronheid, Roel
;
Scheer, Steven
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Views
1929
since deposited on 2021-10-17
1
last month
1
last week
Acq. date: 2025-12-12
Citations