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High-index immersion fluids enabling cost-effective single-exposure lithography for 32nm half pitches

dc.contributor.authorFrench, Roger H.
dc.contributor.authorTran, Hoang V.
dc.contributor.authorAdelman, Doug J.
dc.contributor.authorRogado, Nyrissa S.
dc.contributor.authorKaku, Mureo
dc.contributor.authorMocella, Michael
dc.contributor.authorChen, Charles Y.
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorBernfeld, Adam S.
dc.contributor.authorDerryberry, Rebekah A.
dc.date.accessioned2021-10-17T07:09:22Z
dc.date.available2021-10-17T07:09:22Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13739
dc.sourceIIOimport
dc.titleHigh-index immersion fluids enabling cost-effective single-exposure lithography for 32nm half pitches
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVan Roey, Frieda
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage692417
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 6924


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