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Residue formation in MHM-based low-k etch

dc.contributor.authorGoossens, Danny
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorConard, Thierry
dc.contributor.authorHendrickx, Dirk
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-17T07:20:09Z
dc.date.available2021-10-17T07:20:09Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13788
dc.sourceIIOimport
dc.titleResidue formation in MHM-based low-k etch
dc.typeOral presentation
dc.contributor.imecauthorGoossens, Danny
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorHendrickx, Dirk
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.conference9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate21/09/2008
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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