Authors

Grasser, T.; Kaczer, Ben; Aichinger, T.; Goes, W.; Nelhiebel, M.

Conference

IEEE Integrated Reliability Workshop - IRW

Title

Defect creation stimulated by thermally activated hole trapping as the driving force behind negative bias temperature instability in SiO2, SiON, and high-k gate stacks

Publication type

Proceedings paper

Embargo date

9999-12-31