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Particle removal efficiency and damage analysis of patterned wafers in different solvents after megasonic cleaning
Publication:
Particle removal efficiency and damage analysis of patterned wafers in different solvents after megasonic cleaning
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Halder, Sandip
;
Bearda, Twan
;
Kenis, Karine
;
Janssens, Tom
;
Le, Quoc Toan
;
Wostyn, Kurt
;
Leunissen, Peter
;
Mertens, Paul
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1925
since deposited on 2021-10-17
Acq. date: 2026-01-12
Citations
Metrics
Views
1925
since deposited on 2021-10-17
Acq. date: 2026-01-12
Citations