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AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35

dc.contributor.authorHendrickx, Eric
dc.contributor.authorBirkner, R.
dc.contributor.authorKempsell, Monica
dc.contributor.authorTritchkov, A.
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorScheruebl, T.
dc.date.accessioned2021-10-17T07:35:40Z
dc.date.available2021-10-17T07:35:40Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13854
dc.sourceIIOimport
dc.titleAIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage71221E
dc.source.conferencePhotomask Technology 2008
dc.source.conferencedate7/10/2008
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7122


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