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AIMS TM 45 inspection of CH treated with inverse lithography

dc.contributor.authorHendrickx, Eric
dc.contributor.authorBirkner, Robert
dc.contributor.authorKempsell, Monica
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorRichter, Rigo
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorScheruebl, Thomas
dc.date.accessioned2021-10-17T07:35:54Z
dc.date.available2021-10-17T07:35:54Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13855
dc.sourceIIOimport
dc.titleAIMS TM 45 inspection of CH treated with inverse lithography
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
imec.availabilityPublished - open access
imec.internalnotese-proceedings


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