Show simple item record

Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

dc.contributor.authorHendrickx, Eric
dc.contributor.authorTritchkov, Alexander
dc.contributor.authorSakajiri, Kyohei
dc.contributor.authorGranik, Yuri
dc.contributor.authorKempsell, Monica
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-17T07:36:24Z
dc.date.available2021-10-17T07:36:24Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13857
dc.sourceIIOimport
dc.titleHyper-NA imaging of 45nm node random CH layouts using inverse lithography
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage68240L
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 6924


Files in this item

Thumbnail
Name:
14682.pdf
Size:
478.3Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record