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Critical assessment of error budget components in double patterning immersion lithography

dc.contributor.authorHepp, Birgitt
dc.contributor.authorFinders, Jo
dc.contributor.authorDusa, Mircea
dc.contributor.authorVleeming, Bert
dc.contributor.authorMegens, henry
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorCheng, Shaunee
dc.contributor.authorVandeweyer, Tom
dc.date.accessioned2021-10-17T07:38:22Z
dc.date.available2021-10-17T07:38:22Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13865
dc.sourceIIOimport
dc.titleCritical assessment of error budget components in double patterning immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorVandeweyer, Tom
dc.source.peerreviewno
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
imec.availabilityPublished - imec
imec.internalnotese-proceedings


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