dc.contributor.author | Hikavyy, Andriy | |
dc.contributor.author | Rooyackers, Rita | |
dc.contributor.author | Verheyen, Peter | |
dc.contributor.author | Vellianitis, Georgios | |
dc.contributor.author | Van Dal, Mark | |
dc.contributor.author | Lander, Rob | |
dc.contributor.author | Loo, Roger | |
dc.contributor.author | Caymax, Matty | |
dc.date.accessioned | 2021-10-17T07:42:11Z | |
dc.date.available | 2021-10-17T07:42:11Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13881 | |
dc.source | IIOimport | |
dc.title | Application of HCl etch in the production of novel devices | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Hikavyy, Andriy | |
dc.contributor.imecauthor | Verheyen, Peter | |
dc.contributor.imecauthor | Vellianitis, Georgios | |
dc.contributor.imecauthor | Van Dal, Mark | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 647 | |
dc.source.conference | 213th ECS Meeting | |
dc.source.conferencedate | 18/05/2008 | |
dc.source.conferencelocation | Phoenix, AZ USA | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Meeting Abstracts; Vol. MA 2008-01 | |