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Fabrication, doping and characterization of strained silicon on SiO2 by ion beam techniques

dc.contributor.authorHollaender, Bernd
dc.contributor.authorBuca, Dan
dc.contributor.authorTrinkaus, H.
dc.contributor.authorMantl, Siegfried
dc.contributor.authorLoo, Roger
dc.contributor.authorReiche, Manfred
dc.date.accessioned2021-10-17T07:42:53Z
dc.date.available2021-10-17T07:42:53Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13884
dc.sourceIIOimport
dc.titleFabrication, doping and characterization of strained silicon on SiO2 by ion beam techniques
dc.typeOral presentation
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.conference16th International Conference on Ion Beam Modifications of Materials
dc.source.conferencedate31/08/2008
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - imec


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