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Ex situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processes

dc.contributor.authorHolsteyns, Frank
dc.contributor.authorJanssens, Tom
dc.contributor.authorArnauts, Sophia
dc.contributor.authorVan der Putte, W.
dc.contributor.authorMinsier, Vincent
dc.contributor.authorBrunner, J.
dc.contributor.authorStraka, J.
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-17T07:43:09Z
dc.date.available2021-10-17T07:43:09Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13885
dc.sourceIIOimport
dc.titleEx situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processes
dc.typeProceedings paper
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorMertens, Paul
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage201
dc.source.endpage204
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 134


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