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Understanding and improving double patterning CDU through Monte Carlo simulation

dc.contributor.authorHooge, Joshua
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorKubo, Akihiro
dc.contributor.authorKondo, Yoshihiro
dc.contributor.authorNafus, Kathleen
dc.contributor.authorScheer, Steven
dc.contributor.authorFoubert, Philippe
dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-17T07:43:39Z
dc.date.available2021-10-17T07:43:39Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13887
dc.sourceIIOimport
dc.titleUnderstanding and improving double patterning CDU through Monte Carlo simulation
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorLeray, Philippe
dc.source.peerreviewno
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
imec.availabilityPublished - imec
imec.internalnotese-proceedings


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