Understanding and improving double patterning CDU through Monte Carlo simulation

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Authors
Hooge, Joshua; Hatakeyama, Shinichi; Kubo, Akihiro; Kondo, Yoshihiro; Nafus, Kathleen; Scheer, Steven; Foubert, Philippe; Leray, Philippe; Cheng, Shaunee
Conference
5th International Symposium on Immersion Lithography Extensions
Title
Understanding and improving double patterning CDU through Monte Carlo simulation
Publication type
Proceedings paper
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