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Understanding and improving double patterning CDU through Monte Carlo simulation

Date

2008
Proceedings Paper
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dc.contributor.authorHooge, Joshua
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorKubo, Akihiro
dc.contributor.authorKondo, Yoshihiro
dc.contributor.authorNafus, Kathleen
dc.contributor.authorScheer, Steven
dc.contributor.authorFoubert, Philippe
dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorLeray, Philippe
dc.date.accessioned2021-10-17T07:43:39Z
dc.date.available2021-10-17T07:43:39Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13887
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
dc.title

Understanding and improving double patterning CDU through Monte Carlo simulation

dc.typeProceedings paper
dspace.entity.typePublication
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