Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Understanding and improving double patterning CDU through Monte Carlo simulation
Publication:
Understanding and improving double patterning CDU through Monte Carlo simulation
Date
2008
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hooge, Joshua
;
Hatakeyama, Shinichi
;
Kubo, Akihiro
;
Kondo, Yoshihiro
;
Nafus, Kathleen
;
Scheer, Steven
;
Foubert, Philippe
;
Leray, Philippe
;
Cheng, Shaunee
Journal
Abstract
Description
Metrics
Views
1929
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1929
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations