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Double patterning process with resist freezing technique

dc.contributor.authorHoshiko, Kenji
dc.contributor.authorShioya, Takeo
dc.contributor.authorFujiwara, Koichi
dc.contributor.authorYamaguchi, Yoshikazu
dc.contributor.authorShimokawa, Tsutomu
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorMiller, Andy
dc.contributor.authorVangoidsenhoven, Diziana
dc.date.accessioned2021-10-17T07:45:03Z
dc.date.available2021-10-17T07:45:03Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13893
dc.sourceIIOimport
dc.titleDouble patterning process with resist freezing technique
dc.typeProceedings paper
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
imec.availabilityPublished - open access
imec.internalnotese-proceedings


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