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Dependence of EUV mask printing performance on blank architecture

dc.contributor.authorJonckheere, Rik
dc.contributor.authorHyun, Yoonsuk
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorHermans, Jan
dc.contributor.authorLorusso, Gian
dc.contributor.authorPollentier, Ivan
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-17T07:54:21Z
dc.date.available2021-10-17T07:54:21Z
dc.date.issued2008-03
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13930
dc.sourceIIOimport
dc.titleDependence of EUV mask printing performance on blank architecture
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage69211W
dc.source.conferenceEmerging Lithographic Technologies XXII
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 6921


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