ISSN
0255-5476
Journal
Materials Science Forum
Volume
573-574
Title
RTP requirements for CMOS integration of dual work function phase controlled Ni-FUSI (fully silicided) gates with simultaneous silicidation of nMOS (NiSi) and pMOS (Ni-rich silicide) gates on HfSiON
Publication type
Journal article
Embargo date
9999-12-31
