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DUV resist materials and processes for 0.25 μm and 0.18 μm CMOS devices

dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T15:16:12Z
dc.date.available2021-09-29T15:16:12Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1401
dc.sourceIIOimport
dc.titleDUV resist materials and processes for 0.25 μm and 0.18 μm CMOS devices
dc.typeOral presentation
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceMeeting of the Research Group on Polymers for Microelectronics and Photonics; July 1996
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - imec


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