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Self aligned CuGeN process for 32/22nm nodes and beyond

dc.contributor.authorLiu, C.S.
dc.contributor.authorChen, H.C.
dc.contributor.authorBao, T.I.
dc.contributor.authorVan Olmen, Jan
dc.contributor.authorCroes, Kristof
dc.contributor.authorVan Besien, Els
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorZhao, Chao
dc.contributor.authorSleeckx, Erik
dc.contributor.authorBeyer, Gerald
dc.contributor.authorYu, C.H.
dc.date.accessioned2021-10-17T08:26:41Z
dc.date.available2021-10-17T08:26:41Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14047
dc.sourceIIOimport
dc.titleSelf aligned CuGeN process for 32/22nm nodes and beyond
dc.typeProceedings paper
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.source.peerreviewno
dc.source.beginpage199
dc.source.endpage201
dc.source.conference11th IEEE International Interconnect Technology Conference - IITC
dc.source.conferencedate1/06/2008
dc.source.conferencelocationSan Fransisco, CA USA
imec.availabilityPublished - imec


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