Separable models for computational lithography

Thumbnail
View/open
Metadata
Show full item record
Authors
Liu, Hua-Yu; Zhao, Q.; Chen, J.F.; Jiang, J.; Socha, B.; Van Setten, E.; Engelen, A.; Meessen, J.; Crouse, M.M.; Feng, M.; Shao, W.; Cao, H.; Cao, Y.; Van Look, Lieve; Bekaert, Joost; Vandenberghe, Geert; Finders, Jo
Conference
Photomask and Next-Generation Lithography Mask Technology XV
Title
Separable models for computational lithography
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections