Show simple item record

Separable models for computational lithography

dc.contributor.authorLiu, Hua-Yu
dc.contributor.authorZhao, Q.
dc.contributor.authorChen, J.F.
dc.contributor.authorJiang, J.
dc.contributor.authorSocha, B.
dc.contributor.authorVan Setten, E.
dc.contributor.authorEngelen, A.
dc.contributor.authorMeessen, J.
dc.contributor.authorCrouse, M.M.
dc.contributor.authorFeng, M.
dc.contributor.authorShao, W.
dc.contributor.authorCao, H.
dc.contributor.authorCao, Y.
dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorFinders, Jo
dc.date.accessioned2021-10-17T08:27:17Z
dc.date.available2021-10-17T08:27:17Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14049
dc.sourceIIOimport
dc.titleSeparable models for computational lithography
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage70280X
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XV
dc.source.conferencedate16/04/2008
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7028


Files in this item

Thumbnail
Name:
18205.pdf
Size:
1.161Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record