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Printability verification for double-patterning technology

dc.contributor.authorLuk-Pat, Gerard
dc.contributor.authorPanaite, Petrisor
dc.contributor.authorLucas, Kevin
dc.contributor.authorCork, Christopher
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorMaenhoudt, Mireille
dc.date.accessioned2021-10-17T08:36:24Z
dc.date.available2021-10-17T08:36:24Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14080
dc.sourceIIOimport
dc.titlePrintability verification for double-patterning technology
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.source.peerreviewno
dc.source.beginpage71220Q
dc.source.conferencePhotomask Technology 2008
dc.source.conferencedate6/10/2008
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesSPIE Proceedings; Vol. 7122


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