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MuGFET Observation and CD measurement by using CD-SEM

dc.contributor.authorMaeda, Tatsuya
dc.contributor.authorTanaka, Maki
dc.contributor.authorIsawa, Miki
dc.contributor.authorWatanabe, Kenji
dc.contributor.authorHasegawa, Norio
dc.contributor.authorSekiguchi, Kohei
dc.contributor.authorRooyackers, Rita
dc.contributor.authorCollaert, Nadine
dc.contributor.authorVandeweyer, Tom
dc.date.accessioned2021-10-17T08:37:35Z
dc.date.available2021-10-17T08:37:35Z
dc.date.issued2008-02
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14084
dc.sourceIIOimport
dc.titleMuGFET Observation and CD measurement by using CD-SEM
dc.typeProceedings paper
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage69222P
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXII
dc.source.conferencedate25/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://spiedl.org/vsearch/servlet/VerityServlet?KEY=SPIEDL&smode=strresults&sort=rel&maxdisp=25&threshold=0&pjournals=SPIEDL&pos
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 6922


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