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Conference contributions
Lithography options and challenges for sub-45nm node interconnect layers
Publication:
Lithography options and challenges for sub-45nm node interconnect layers
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Date
2008
Proceedings Paper
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17802.pdf
2.47 MB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Maenhoudt, Mireille
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Abstract
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1799
since deposited on 2021-10-17
Acq. date: 2026-01-11
Citations
Metrics
Views
1799
since deposited on 2021-10-17
Acq. date: 2026-01-11
Citations