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Alternative process schemes for double patterning that eliminate the intermediate etch step

dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorGronheid, Roel
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorMatsuda, Takashi
dc.contributor.authorVangoidsenhoven, Diziana
dc.date.accessioned2021-10-17T08:38:08Z
dc.date.available2021-10-17T08:38:08Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14086
dc.sourceIIOimport
dc.titleAlternative process schemes for double patterning that eliminate the intermediate etch step
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage69240P
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 6924


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