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Double litho, double etch (LELE) process challenges for 22nm HP and beyond
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Authors
Maenhoudt, Mireille
;
Wiaux, Vincent
;
Cheng, Shaunee
;
Vandenberghe, Geert
;
Ronse, Kurt
Conference
Sematech Workshop on Optical Lithography at 22nm and 16nm
Title
Double litho, double etch (LELE) process challenges for 22nm HP and beyond
Publication type
Oral presentation
Embargo date
9999-12-31
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