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Double litho, double etch (LELE) process challenges for 22nm HP and beyond

dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorWiaux, Vincent
dc.contributor.authorCheng, Shaunee
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-17T08:38:42Z
dc.date.available2021-10-17T08:38:42Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14088
dc.sourceIIOimport
dc.titleDouble litho, double etch (LELE) process challenges for 22nm HP and beyond
dc.typeOral presentation
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceSematech Workshop on Optical Lithography at 22nm and 16nm
dc.source.conferencedate15/05/2008
dc.source.conferencelocationBolton Landing, NY USA
imec.availabilityPublished - open access


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