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Development of a metal gate and silicon selective "dry ash only" process for combined extension and halo implanted photo resist
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Authors
Mannaert, Geert
;
Baklanov, Mikhaïl
;
Goossens, Danny
;
Vrancken, Christa
;
Boullart, Werner
Conference
Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS
Title
Development of a metal gate and silicon selective "dry ash only" process for combined extension and halo implanted photo resist
Publication type
Proceedings paper
Embargo date
9999-12-31
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