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Post extension ion implant photo resist strip for 32 nm technology and beyond
Publication:
Post extension ion implant photo resist strip for 32 nm technology and beyond
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Date
2008
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17465.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mannaert, Geert
;
Witters, Liesbeth
;
Shamiryan, Denis
;
Boullart, Werner
;
Han, Keping
;
Luo, Shiian
;
Falepin, Annelies
;
Sonnemans, Roger
;
Berry, Ivan
;
Waldfried, Carlo
Journal
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2013
since deposited on 2021-10-17
Acq. date: 2025-12-11
Citations
Metrics
Views
2013
since deposited on 2021-10-17
Acq. date: 2025-12-11
Citations