Post extension ion implant photo resist strip for 32 nm technology and beyond

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Authors
Mannaert, Geert; Witters, Liesbeth; Shamiryan, Denis; Boullart, Werner; Han, Keping; Luo, Shiian; Falepin, Annelies; Sonnemans, Roger; Berry, Ivan; Waldfried, Carlo
Conference
9th International Symposium on Utra Clean Processing of Semiconductor Surfaces - UCPSS
Title
Post extension ion implant photo resist strip for 32 nm technology and beyond
Publication type
Oral presentation
Embargo date
9999-12-31
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