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Post extension ion implant photo resist strip for 32 nm technology and beyond

dc.contributor.authorMannaert, Geert
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorShamiryan, Denis
dc.contributor.authorBoullart, Werner
dc.contributor.authorHan, Keping
dc.contributor.authorLuo, Shiian
dc.contributor.authorFalepin, Annelies
dc.contributor.authorSonnemans, Roger
dc.contributor.authorBerry, Ivan
dc.contributor.authorWaldfried, Carlo
dc.date.accessioned2021-10-17T08:46:34Z
dc.date.available2021-10-17T08:46:34Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14115
dc.sourceIIOimport
dc.titlePost extension ion implant photo resist strip for 32 nm technology and beyond
dc.typeOral presentation
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorFalepin, Annelies
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference9th International Symposium on Utra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate21/09/2008
dc.source.conferencelocationBruges Belgium
dc.identifier.urlwww.ucpss.org
imec.availabilityPublished - open access


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