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In-situ spatial analysis of RF voltage during plasma etching

dc.contributor.authorMilenin, Alexey
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-17T09:02:59Z
dc.date.available2021-10-17T09:02:59Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14168
dc.sourceIIOimport
dc.titleIn-situ spatial analysis of RF voltage during plasma etching
dc.typeProceedings paper
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage17
dc.source.endpage22
dc.source.conferencePlasma Processing 17
dc.source.conferencedate18/05/2008
dc.source.conferencelocationPhoenix, AZ USA
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 13; Issue 8


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