Publication:
Low-temperature chemical vapor deposition of highly doped n-type epitaxial Si at high growth rate
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1888 since deposited on 2021-10-17
1last month
Acq. date: 2026-02-25
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Statistics
Views
1888 since deposited on 2021-10-17
1last month
Acq. date: 2026-02-25
Citations