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Atomic layer deposition of HfO2 thin films on InxGa1-xAs

dc.contributor.authorO'Mahony, A.
dc.contributor.authorO'Connor, E.
dc.contributor.authorLong, R.
dc.contributor.authorThomas, K.
dc.contributor.authorPovey, I.M.
dc.contributor.authorHurley, P.K.
dc.contributor.authorPemble, M.E.
dc.contributor.authorBrennan, B.
dc.contributor.authorHughes, G.
dc.contributor.authorBrammertz, Guy
dc.contributor.authorAfanas'ev, V.V.
dc.date.accessioned2021-10-17T09:29:33Z
dc.date.available2021-10-17T09:29:33Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14251
dc.sourceIIOimport
dc.titleAtomic layer deposition of HfO2 thin films on InxGa1-xAs
dc.typeOral presentation
dc.contributor.imecauthorBrammertz, Guy
dc.contributor.orcidimecBrammertz, Guy::0000-0003-1404-7339
dc.source.peerreviewno
dc.source.conference8th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate30/06/2008
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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