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Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability
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Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability
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Date
2008
Proceedings Paper
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16049.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ortolland, Claude
;
Noda, Taiji
;
Chiarella, Thomas
;
Kubicek, Stefan
;
Kerner, Christoph
;
Vandervorst, Wilfried
;
Opdebeeck, Ann
;
Vrancken, Christa
;
Horiguchi, Naoto
;
de Potter de ten Broeck, Muriel
;
Aoulaiche, Marc
;
Rosseel, Erik
;
Felch, S.B.
;
Absil, Philippe
;
Schreutelkamp, Rob
;
Biesemans, Serge
;
Hoffmann, Thomas Y.
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1975
since deposited on 2021-10-17
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last week
Acq. date: 2026-02-28
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Statistics
Views
1975
since deposited on 2021-10-17
2
last month
1
last week
Acq. date: 2026-02-28
Citations