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Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability

dc.contributor.authorOrtolland, Claude
dc.contributor.authorNoda, Taiji
dc.contributor.authorChiarella, Thomas
dc.contributor.authorKubicek, Stefan
dc.contributor.authorKerner, Christoph
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorOpdebeeck, Ann
dc.contributor.authorVrancken, Christa
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorAoulaiche, Marc
dc.contributor.authorRosseel, Erik
dc.contributor.authorFelch, S.B.
dc.contributor.authorAbsil, Philippe
dc.contributor.authorSchreutelkamp, Rob
dc.contributor.authorBiesemans, Serge
dc.contributor.authorHoffmann, Thomas Y.
dc.date.accessioned2021-10-17T09:31:27Z
dc.date.available2021-10-17T09:31:27Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14256
dc.sourceIIOimport
dc.titleLaser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability
dc.typeProceedings paper
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorKerner, Christoph
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorOpdebeeck, Ann
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage186
dc.source.endpage187
dc.source.conferenceSymposium on VLSI Technology. Digest of Technical Papers
dc.source.conferencedate17/06/2008
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access


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