Show simple item record

Crystallization study of thin ZrO2 ALD films on Al203 and on TiN for DRAM MIMCAP applications

dc.contributor.authorPawlak, Malgorzata
dc.contributor.authorMenou, Nicolas
dc.contributor.authorWang, Xin Peng
dc.contributor.authorDilliway, G.
dc.contributor.authorPierreux, D.
dc.contributor.authorFischer, P.
dc.contributor.authorVos, Rita
dc.contributor.authorHoyer, R.
dc.contributor.authorKittl, Jorge
dc.contributor.authorWouters, Dirk
dc.contributor.authorBiesemans, Serge
dc.date.accessioned2021-10-17T09:45:08Z
dc.date.available2021-10-17T09:45:08Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14298
dc.sourceIIOimport
dc.titleCrystallization study of thin ZrO2 ALD films on Al203 and on TiN for DRAM MIMCAP applications
dc.typeOral presentation
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorBiesemans, Serge
dc.source.peerreviewno
dc.source.conferenceMRS Spring Meeting Symposium H: Materials Science of High-k Dielectric Stacks
dc.source.conferencedate24/03/2008
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesPaper H4.30


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record