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Atomic layer deposition of hafnium titanates dielectric layers

dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorMenou, Nicolas
dc.contributor.authorWang, Xin Peng
dc.contributor.authorWouters, Dirk
dc.contributor.authorKittl, Jorge
dc.contributor.authorSwerts, Johan
dc.contributor.authorKnaepen, W.
dc.contributor.authorDetavernier, Christophe
dc.date.accessioned2021-10-17T09:57:21Z
dc.date.available2021-10-17T09:57:21Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14334
dc.sourceIIOimport
dc.titleAtomic layer deposition of hafnium titanates dielectric layers
dc.typeProceedings paper
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorSwerts, Johan
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference8th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate29/06/2008
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - open access


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