Publication:
Progressive degradation of TiN/SiON and TiN/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stress
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1906 since deposited on 2021-10-17
Acq. date: 2026-10-12
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Views
1906 since deposited on 2021-10-17
Acq. date: 2026-10-12
Citations