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Impact of multiple sub-melt laser scans on the activation and diffusion of shallow Boron junctions

dc.contributor.authorRosseel, Erik
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorClarysse, Trudo
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorMoussa, Alain
dc.contributor.authorLin, Rong
dc.contributor.authorPetersen, Dirch
dc.contributor.authorNielsen, Peter
dc.contributor.authorHansen, Otto
dc.contributor.authorBennett, Nick
dc.contributor.authorCowern, Nick
dc.date.accessioned2021-10-17T10:16:48Z
dc.date.available2021-10-17T10:16:48Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14391
dc.sourceIIOimport
dc.titleImpact of multiple sub-melt laser scans on the activation and diffusion of shallow Boron junctions
dc.typeProceedings paper
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorMoussa, Alain
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage135
dc.source.endpage140
dc.source.conference16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP
dc.source.conferencedate30/09/2008
dc.source.conferencelocationLas Vegas, NV USA
imec.availabilityPublished - open access


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