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Single-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm wafer

dc.contributor.authorSano, K.
dc.contributor.authorIzumi, A.
dc.contributor.authorEitoku, A.
dc.contributor.authorSnow, J.
dc.contributor.authorNyns, Laura
dc.contributor.authorKubicek, Stefan
dc.contributor.authorSinganamalla, Raghunath
dc.contributor.authorRichard, Olivier
dc.contributor.authorConard, Thierry
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-17T10:26:32Z
dc.date.available2021-10-17T10:26:32Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14419
dc.sourceIIOimport
dc.titleSingle-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm wafer
dc.typeProceedings paper
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage53
dc.source.endpage56
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 134


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