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Challenges of single-wafer wet cleaning for low temperature pre-epitaxial treatment of SiGe

dc.contributor.authorSano, K.
dc.contributor.authorLeys, Frederik
dc.contributor.authorDilliway, Gabriela
dc.contributor.authorLoo, Roger
dc.contributor.authorMertens, Paul
dc.contributor.authorSnow, J.
dc.contributor.authorIzumi, A.
dc.contributor.authorEitoku, A.
dc.date.accessioned2021-10-17T10:26:55Z
dc.date.available2021-10-17T10:26:55Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14420
dc.sourceIIOimport
dc.titleChallenges of single-wafer wet cleaning for low temperature pre-epitaxial treatment of SiGe
dc.typeProceedings paper
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage243
dc.source.endpage246
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 134


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