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Application of single-wafer wet cleaning prior to epitaxial SiGe process

dc.contributor.authorSano, K.
dc.contributor.authorWada, Masayuki
dc.contributor.authorLeys, Frederik
dc.contributor.authorLoo, Roger
dc.contributor.authorMertens, Paul W.
dc.contributor.authorSnow, James
dc.contributor.authorIzumi, Akira
dc.contributor.authorMiya, Katsuhiko
dc.contributor.authorEitoku, Atsuro
dc.date.accessioned2021-10-17T10:27:16Z
dc.date.available2021-10-17T10:27:16Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14421
dc.sourceIIOimport
dc.titleApplication of single-wafer wet cleaning prior to epitaxial SiGe process
dc.typeMeeting abstract
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.conference9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate21/09/2008
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - imec


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